The additive, media and compound development in surface polishing industry December 30 , 2022

The additive, media and compound development in surface polishing industry


In the surface polishing industry, there are several methods that can be used to achieve a smooth and shiny finish on a variety of materials. These methods include additive, media, and compound development.



Additive development involves the use of polishing agents that are applied to the surface to be polished. These agents can be in the form of liquids, pastes, or powders, and they work by reacting with the surface to create a smooth finish. Additive development is often used for materials that are difficult to polish or have an irregular surface.


Media development involves the use of abrasive particles, such as aluminum oxide or silicon carbide, to remove material from the surface and create a smooth finish. These particles are suspended in a liquid or applied to a pad, and the surface is polished by rubbing the pad against it. Media development is often used for materials that are hard or have a rough surface.


Compound development involves the use of a chemical agent, such as a metal oxide or abrasive compound, to remove material from the surface and create a smooth finish. These compounds are applied to the surface and then polished using a pad or other tool. Compound development is often used for materials that are difficult to polish or have a delicate surface.


Overall, the choice of method for surface polishing will depend on the material being polished, the desired finish, and the equipment and resources available.


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